Universal magnetron deposition system (UJEP1)

The magnetron deposition system with variable system up to 3 magnetron with 2inch targets in diameter. Various power supplies are available RF, DC, RF pulsed, DC pulsed for sputtering of metals or metal oxides.

Aply for this equipment

Range of Expertise

Availability

Jan Evangelista Purkyně University in Ústí nad Labem

Kormunda Martin

+420 475 286 624

martin.kormunda@ujep.cz

Pasteurova , 3544/1 , Ústí nad Labem , 400 96

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